Electron Beam Lithography

Manufacture: Raith Voyager

< 10 nm line width
Beam energy from 10 keV to 50 keV
Electrostatic deflection (single stage, thus no subfields)
Thermal field emission electron source technology
~50 pA to ~40 nA beam current
Flexible, adjustable beam current and reproducible presets, due to a 2x condensor zoom lens configuration
Writefield size: up to 500 μm at 50 kV (2400 μm at 10 kV)
High-speed 50 MHz pattern generator
Laser-interferometer controlled stage with 150 x 150 mm travel range
Samples with an 8-inch diameter or 7-inch square can be loaded (see options list for various dedicated holders)
Dry vacuum system with automatic 8-inch load lock